NB INSTRUMENT
SALD Sheet-to-Sheet Spatial ALD Pilot Platform
Pilot-Scale Spatial ALD for Large-Area Substrates
Pilot-Scale Spatial ALD for Large-Area Substrates
A pilot-scale deposition system designed for large-area substrates and process scale-up.
Patented Spatial Atomic Layer Deposition technology delivers uniform, conformal films with automated sheet handling and industrial-grade reliability for solar, semiconductor and advanced materials industries.
From pilot process to production pathway.
Pilot-Scale Spatial ALD Technology
Spatially separated precursors support continuous atomic-layer deposition.
Large-Area Substrate Processing
Designed for functional films on large-area sheets.
Industrial Process Scale-Up
A pilot environment for transferring developed processes toward production.
Automated Sheet Handling
Conveyor-based substrate transport through the coating process.
Pilot platform specification.
| Deposition Technology | Spatial Atomic Layer Deposition |
|---|---|
| Process Mode | Atmospheric pressure |
| Substrate Format | Large-area sheet-to-sheet |
| Throughput | Pilot-scale continuous processing |
| Materials | SnOx, NiOx, Al₂O₃, AZO and other functional oxides |
| Handling | Automated conveyor-based substrate transport |
| Automation | PLC controlled with recipe management |
| Safety | Integrated industrial safety systems |
From energy to functional surfaces.
- Perovskite & Tandem Solar Cells
- Photovoltaic Pilot Manufacturing
- Semiconductor Process Scale-Up
- Barrier & Passivation Coatings
- Functional Oxide Thin Films
- Industrial R&D and Process Transfer
Thin Film & PVD Coating. Nanotechnology & Nanomaterials.
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