
FISSION — Magnetron Sputtering Source
For 2", 3" and 4" targets, with DC, RF, HiPIMS and pulsed-DC sputtering options.
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Highly modular thin-film deposition. A platform that grows with your research — add sources, stack chambers and reconfigure at any point.
The HEX Series is a family of highly modular PVD systems. Magnetron sputtering, electron-beam, low-temperature and thermal evaporation sources can be combined in a single compact platform.
Available in three sizes — HEX, HEX-L and HEX-XL — for samples from 4" to 12".

Expand the system as new deposition needs arise.
Double chamber volume by stacking.
Detachable plates allow either orientation.
Change source-to-substrate distance and angle.
Full research capability in a benchtop-scale frame.
Configured for materials, semiconductor, optical and PV research.
| HEX | HEX-L | HEX-XL | |
|---|---|---|---|
| Sample size | 4" | 6" | 12" |
| Max. sources | 3 | 6 | 6 |
| Magnetron size | 2" | 2" or 3" | 3" or 4" |
| Chamber volume | 12 L / 24 L stacked | 50 L / 100 L stacked | 86 L / 172 L stacked |
| Base pressure* | 5×10⁻⁷ mbar | <5×10⁻⁷ mbar | <5×10⁻⁷ mbar |
*Ultimate base pressure measured on factory-tested systems.

For 2", 3" and 4" targets, with DC, RF, HiPIMS and pulsed-DC sputtering options.
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Precise organic evaporation from 50–600 °C, with glovebox integration available for the HEX Series.
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High-accuracy, sub-monolayer evaporation with four material pockets for co-deposition.
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A robust, cost-effective thermal boat source for depositing standard metals.
Read moreModule names, descriptions and images: Korvus Technology.


Product information referenced from Korvus Technology.
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